| 摘要 |
The present invention relates to a wafer defect testing device comprising: a stage, a bright field illuminator; a dark field illuminator; a camera; and an image processor. The stage supports a wafer, and is forwardly and backwardly moved to a first horizontal direction. The bright field illuminator is extended to a second horizontal direction which is vertical to the first horizontal direction on an upper side of the stage; and irradiates bar type bright field light, which is longer than the diameter of the wafer, to the wafer when the stage is forwardly moved along the first horizontal direction. The dark field illuminator is extended to the second horizontal direction on the upper part of the stage; and irradiates bar type dark field light, which is longer than the diameter of the wafer, to the wafer when the stage is backwardly moved along the first horizontal direction. The camera is positioned on the upper part of the stage; obtains a bright field image of the wafer when the stage is forwardly moved along the first horizontal direction; and obtains a dark field image of the wafer when the stage is backwardly moved along the first horizontal direction. The image processor matches the bright field image and the dark field image of the wafer obtained in the camera; and detects a bright field defect and a dark field defect from the matched image at the same time. Therefore, the wafer defect testing device rapidly and accurately tests the defect of the wafer. |
