发明名称 樹脂、レジスト組成物及びレジストパターン製造方法
摘要 The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom, T1 represents a C4-C34 sultone ring group optionally having one or more substituents, Z1 represents a C1-C6 alkanediyl group optionally having one or more substituents, or a group represented by the formula (a-1): -A10X10-A11sX11-A12-(a-1) wherein X10 and X11 each independently represents -O-, -NH-, -CO-, -CO-O-, -O-CO-, -CO-NH- or -NH-CO-, A10, A11 and A12 each independently represent a C1-C5 divalent aliphatic hydrocarbon group optionally having one or more substituents, and s represents 0 or 1, and Z2 represents a single bond or -CO-.
申请公布号 JP5934502(B2) 申请公布日期 2016.06.15
申请号 JP20110276762 申请日期 2011.12.19
申请人 住友化学株式会社 发明人 金 亨柱;釜淵 明;市川 幸司
分类号 C08F20/38;C07D327/04;C08F20/28;G03F7/039;H01L21/027 主分类号 C08F20/38
代理机构 代理人
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