| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition for forming impurity diffusion layer for forming a pattern by an ink jet system for suppressing formation of the impurity diffusion layer in a region except for a desired region on a semiconductor substrate and to provide a manufacturing method of the impurity diffusion layer using the composition for forming the impurity diffusion layer. <P>SOLUTION: The composition for forming the impurity diffusion layer for ink jet includes: at least one kind of an inorganic particle including a doner element which is selected from a group consisting of glass particles including the doner element and particles including a reaction product of silicon alkoxide and a phosphorus compound, or at least one kind of inorganic particle including an acceptor element which is selected from a group consisting of glass particles including the acceptor element, boron nitride particles, and particles including a reaction product of silicon alkoxide and a boron compound; and a dispersion medium. The impurity diffusion layer is manufactured by applying the composition for forming the impurity diffusion layer onto the semiconductor substrate by the ink jet system and performing thermal diffusion treatment. <P>COPYRIGHT: (C)2013,JPO&INPIT |
