| 摘要 |
The present invention is a deposition mask (1) used to form film in which a plurality of thin-film patterns are arranged side-by-side at a constant array pitch on top of a substrate. This deposition mask (1) comprises: transparent resin film (2) having the same area as the substrate, arranging the thin-film patterns side-by-side at the same array pitch, and forming a plurality of opening patterns (4) having the same dimensional shape as that of the thin-film patterns; and a holding member (3) made of a magnetic metal plate attached securely to one surface of the film (2) and having a plurality of through-holes (5) corresponding to the opening patterns (4) whose dimensional shape is greater than that of the opening patterns (4). The thermal expansion coefficient of the holding member (3) is less than 6 × 10-6/°C. In this way, a high-definition thin-film pattern can be formed on a large substrate in a single deposition. |
