| 摘要 |
A substrate cleaning device and a method for cleaning a substrate using same. The substrate cleaning device comprises a shield that comprises a top plate, a side wall extending downward from the top plate and a sprinkler arranged in the shield. The width of the shield and the width of the sprinkler cover the width of the substrate, and the side wall extends to the position near the surface of the substrate. When the substrate cleaning device is used for cleaning the substrate, water drop in external environment cannot drop on the substrate, so that the condition that the substrate has different degrees of etching is avoided, and accordingly the problem that irreparable spots appear on a liquid crystal panel is avoided. |
