| 摘要 |
[Problem] To provide a composite substrate whereby a nano-carbon film having no defect can be manufactured at low cost. [Solution] Disclosed is a composite substrate manufacturing method wherein an ion implanted region is formed by implanting ions from a surface of a single crystal silicon carbide substrate, and a single crystal silicon carbide substrate surface into which ions are implanted, and a main surface of a handle substrate are bonded to each other, then, the single crystal silicon carbide substrate is peeled in the ion implanted region, and a single crystal silicon carbide thin film is transferred onto the handle substrate. The surface roughness RMS of the bonding surface of the single crystal silicon carbide substrate, and that of the bonding surface of the handle substrate are equal to or less than 1.00 nm. |
