| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition material based on titanium oxide having performance equivalent to a vapor deposition material of titanium suboxide and sufficient mechanical strength that may inhibit an occurrence of splash and that may give a vapor deposition film of titanium dioxide having high refractive index stably regardless of an object for vapor deposition.SOLUTION: A vapor deposition material comprises a sintered body consisting of: a major component consisting of a titanium oxide represented by a composition formula TiO(1.4≤x≤1.8); a first accessory component consisting of at least one selected from a group consisting of aluminum oxide, zirconium oxide, hafnium oxide and ytterbium oxide; a second accessory component consisting of at least one selected from a group consisting of a compound having a garnet structure and yttrium oxide; and a third accessory component consisting of at least one titanate salt. |
