APPARATUS AND METHOD FOR EDGE EXPOSURE, APPARATUS FOR TREATING A SUBSTRATE

摘要

The present invention relates to an edge exposure apparatus and a substrate treating apparatus including the same. According to an embodiment of the present invention, the edge exposure apparatus includes: a support unit supporting a substrate; and a light irradiation unit including a light source irradiating light to four sides of the substrate at the same time, thereby improving efficiency of an edge exposure process.