| 摘要 |
The present invention relates to a coating method and a coating apparatus. A slip opening portion of a slit nozzle is placed in an elongated manner to be extended from a central portion of a circular substrate to an outer edge portion of the substrate in one direction, and the length in a length direction is less than the radius of the substrate. A liquid chemical is discharged onto the substrate by the slit nozzle. At this time, a rotation maintaining unit relatively rotates the substrate and the slit nozzle around the central portion of the substrate. Then, the entire liquid chemical discharged from the slit nozzle reaches the substrate to form an appropriate liquid column and a liquid chemical film is formed on a substantially entire surface of the substrate along the outer edge portion of the circular substrate. Accordingly, unnecessary liquid chemical can be suppressed and appropriate liquid chemical coating can be performed on the substrate. |
