| 摘要 |
The present invention relates to a substrate holding device, a lithography device, and a method for manufacturing articles, wherein the substrate holding device more accurately corrects a bent substrate than a case in which air suction is performed at the same time. The substrate holding device includes: a holding member having a hole for discharging air in a space between the substrate and the holding member; and a ring-shaped seal member on a lower surface of a protrusion unit of the holding member to define the space. A first area has the same center as a plane figure of the holding member and is an area of a figure obtained by reducing the size of the plane figure by two-thirds to four-fifths. A second area exists between the first area and the seal member. The hole is formed to satisfy: (the total area of an air suction hole formed in the second area / the area of the second area) > (the total area of the hole in the total area of the first and second areas / the total area of the first and second areas). The hole is connected to a pipe at a position corresponding to the first area of the holding member. |
