| 摘要 |
The present invention relates to a method for producing an electrode for OLEDs, comprising the following successive steps: (a) depositing, on a transparent substrate, a metal film composed of silver or of an alloy of silver having a thickness in the range between 35 and 70 nm, preferably between 45 and 65 nm; (b) heating the substrate covered with the metal film to a temperature in the range between 200° C. and 400° C., for a period of at least 5 minutes, preferably in the range between 20 and 60 minutes, so as to obtain the dewetting of the metal film and the formation of a random metal grid on the transparent substrate; (c) covering the transparent substrate and the random metal grid with a continuous layer of a transparent conductive material. |
