发明名称 Method for analyzing an EDS signal
摘要 The invention relates to a method for analyzing the output signal of a Silicon Drift Detector (SDD). A SDD is used for detecting X-rays in e.g. Scanning Electron Microscopes and X-ray analysis instruments, where X-rays are emitted by a sample as a result of impinging radiation. The signal of a SDD comprises a number of randomly spaced steps, in which the step height is a function of the energy of the detected X-ray photon. The variance in step height is a function of the averaging time that can be used to determine the plateau between steps: averaging over a short interval (405) results in more uncertainty of the plateau value than a long interval (403). As the step height relies on determination of the preceding plateau and the following plateau value, step heights (401, 402) have different reliabilities/variances. By according a weight factor, the weight factor a function of the variance such that a step with a low variance (high reliability) is associated with a larger weight factor than a step with a high variance (low reliability), measurement values with a low variance, corresponding to a high reliance, are emphasized. This results in better resolved spectra.
申请公布号 EP2653892(B1) 申请公布日期 2016.06.08
申请号 EP20130164043 申请日期 2013.04.17
申请人 FEI COMPANY 发明人 KOOIJMAN, CORNELIS;DE VOS, GERT-JAN
分类号 G01T1/17;G01T1/36 主分类号 G01T1/17
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