CHARGED PARTICLE BEAM APPARATUS

摘要

A charged particle beam apparatus comprises: a charged particle source (101) for generating a charged particle beam; a focus adjustment unit (119) for adjusting the focal position of the charged particle beam; a deflection unit (104) for scanning a sample with the charged particle beam; a detection unit (111) for detecting charged particles generated when irradiating the sample with the charged particle beam; a detected charged particle selection unit (109) for selecting the charged particles detected by the detection unit (111); and a control processing unit for performing focus adjustment in the focus adjustment unit(119) and reference adjustment in the detected charged particle selection unit (109) using information, obtained by a single scan, from the detection unit (111).