| 摘要 |
The present invention is to provide a substrate transfer system to effectively suppress pollution of a substrate caused by particles from a high speed elevation of a substrate transfer means using a simple structure, and a heat treatment apparatus using the substrate transfer system. The substrate transfer system comprises: a substrate transfer means (3) which transfers a substrate (W) while holding the substrate; a lifting mechanism (5) which has a support shaft (4) extending in a vertical direction, and moves the substrate transfer means within a predetermined range along the support shaft; a first exhaust port (50) which is formed above the upper limit of the predetermined range, on the support shaft and/or in the vicinity on the support shaft; a second exhaust port (51) which is formed below the lower limit of the predetermined range, on the support shaft and/or in the vicinity on the support shaft; and an exhaust means (36) which is connected such that exhaust is available through the first exhaust port and the second exhaust port. |
