发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR LASER
摘要 PROBLEM TO BE SOLVED: To obtain a manufacturing method of a semiconductor laser, capable of suppressing a reflection film formed on a resonance end surface from being peeled.SOLUTION: A manufacturing method of a semiconductor laser includes the steps of: forming a plurality of semiconductor lasers 2 separated with each other by a separation part 3, on a semiconductor substrate 1; forming a reflection film 8 on resonance end surfaces of the semiconductor lasers 2 and end surfaces of the separation parts 3 which exist on the same plane; removing the reflection film 8 on each separation part 3 while leaving the reflection film 8 on a light emitting point 6 of each of the semiconductor lasers 2; and, after removing the reflection film 8 on each separation part 3, separating the semiconductor lasers 2 individually with each separation part 3 as a boundary.SELECTED DRAWING: Figure 6
申请公布号 JP2016103588(A) 申请公布日期 2016.06.02
申请号 JP20140241771 申请日期 2014.11.28
申请人 MITSUBISHI ELECTRIC CORP 发明人 KAWASAKI KAZUSHIGE
分类号 H01S5/028 主分类号 H01S5/028
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