发明名称 |
POLYETHER COMPOUND, METHOD FOR PREPARING SAME AND PHOTORESIST COMPOSITION |
摘要 |
A polyether compound which is as shown in Formula (I), wherein R1 is a polyether backbone of the polyether polyol; R2 is hydrogen or C1˜C5 alkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage.; |
申请公布号 |
US2016154305(A1) |
申请公布日期 |
2016.06.02 |
申请号 |
US201314366382 |
申请日期 |
2013.11.25 |
申请人 |
BOE TECHNOLOGY GROUP CO., LTD. |
发明人 |
WANG Xuelan |
分类号 |
G03F7/027;C08G65/48 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
1. A polyether compound which is as shown in Formula (I): wherein R1 is a polyether backbone of the polyether polyol; R2 is hydrogen or C1˜C5 alkyl; n is 3, 4 or 5. |
地址 |
Beijing CN |