| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern having good line edge roughness with an excellent focus margin (DOF).SOLUTION: The resist composition contains a resin having a structural unit represented by formula (IA) or formula (IB), an acid generator, and a compound represented by formula (II). [In the formulae, Rand Reach represent a 1-6C alkyl group which may have a halogen atom, or the like; Rto Reach represent a hydrogen atom, a 1-24C hydrocarbon group, or the like; n' represents an integer of 0-3; Rto Reach represent a hydrogen atom, a 1-12C hydrocarbon group, or the like; and n4 and n5 each represent an integer of 0-3.]SELECTED DRAWING: None |
