| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating method and a coating device capable of excellently coating a chemical on a circular substrate, while restraining a useless chemical.SOLUTION: A slit opening part 21 of a slit nozzle 3 is arranged lengthwise so as to extend in one direction to an outer edge part E of a substrate W from a central part CT of the circular substrate W, and is also constituted so that the length in the lengthwise direction is less than a radius of the substrate W. A chemical is discharged on the substrate W by such a slit nozzle 3, but in this case, the substrate W and the slit nozzle 3 are relatively rotated around the central part CT of the substrate W by a rotary holding part 2. Thus, the chemical discharged from the slit nozzle 3 is wholly landed on the substrate W, and forms an excellent liquid column, and a film F of the chemical is formed on the substantially whole surface of the substrate W along the outer edge part of the circular substrate W. Thus, while restraining a useless chemical, the chemical can be excellently coated on the substrate W.SELECTED DRAWING: Figure 1 |
