| 摘要 |
The invention relates to a lithography apparatus (100) for writing to substrate wafers (300) comprising: - a light generating device (110) comprising one or a plurality of light sources (111, 112, 113) for generating light, - a light transferring device (120) comprising a number of optical waveguides (121i-121N) for transferring the light from the light generating device (110) to a writing device (140), - the writing device (140) comprising a plurality of individually controllable write heads (200i,j) for projecting the light from the one or the plurality of light sources (111, 112, 113) in different regions of a substrate wafer (300), - a transport device (150) for moving the substrate wafer (300) relative to the writing device (140) in a predefined transport direction (x), and a control device (170) for controlling the writing process on the substrate wafer (300). |
