| 摘要 |
PURPOSE: To individually correct a positional deviation amount caused by beam deflection of each beam of a multi-beam.CONSTITUTION: A multi-charged particle beam drawing apparatus of one embodiment comprises: an acquisition unit 53 for acquiring an irradiation position deviation amount of each beam of a multi-beam, where the irradiation position deviation amount depends on a tracking amount by tracking control; a correction factor calculation unit 54 for calculating, for each beam and for each irradiation position, a correction factor for correcting an irradiation position deviation amount depending on the tracking amount; a drawing data processing unit 50 for generating, using a correction factor for each tracking action, shot data for correcting an irradiation position deviation amount depending on the tracking amount, of each beam of the multi-beam; and a deflection control circuit 130 for controlling, using the shot data, a plurality of blankers.SELECTED DRAWING: Figure 1 |
