| 摘要 |
[Problem] To provide: a layered-body film and an electrode substrate film having exceptional etchability, in which an etched circuit pattern is difficult to see under high-intensity lighting; and a method for manufacturing these films. [Solution] Provided is a layered-body film configured of a transparent substrate 60 comprising a plastic film, and a layered film provided on at least one surface of the transparent substrate, wherein the layered-body film is characterized in that: the layered film has metal absorption layers 61, 63 of a first layer of metal layers (62, 65), (64, 66) of a second layer, as counted from the transparent substrate side; and the metal absorption layers are formed by a reactive sputtering method involving the use of an oxygen-containing reactive gas and a metal target comprising elemental Ni or an alloy including two or more elements selected from Ni, Ti, Al, V, W, Ta, Si, Cr, Ag, Mo, Cu, the reactive gas containing water. |
