发明名称 Arrays Of Recessed Access Gate Lines, Arrays Of Conductive Lines, Arrays Of Recessed Access Gate Lines And Conductive Lines, And Memory Circuitry
摘要 An array of recessed access gate lines includes active area regions having dielectric trench isolation material there-between. The trench isolation material comprises dielectric projections extending into opposing ends of individual active area regions under an elevationally outermost surface of material of the active area regions. The active area material is elevationally over the dielectric projections. Recessed access gate lines individually extend transversally across the active area regions and extend between the ends of immediately end-to-end adjacent active area regions within the dielectric trench isolation material. Other arrays are disclosed, as are methods.
申请公布号 US2016155745(A1) 申请公布日期 2016.06.02
申请号 US201615005360 申请日期 2016.01.25
申请人 Micron Technology, Inc. 发明人 Tang Sanh D.;Karda Kamal M.;Mueller Wolfgang;Dhir Sourabh;Kerr Robert;Hwang Sangmin;Liu Haitao
分类号 H01L27/108;H01L29/06;H01L23/528 主分类号 H01L27/108
代理机构 代理人
主权项 1. An array of recessed access gate lines, comprising: active area regions having dielectric trench isolation material there-between, the trench isolation material comprising dielectric projections extending into opposing ends of individual active area regions under an elevationally outermost surface of material of the active area regions, the active area material being elevationally over the dielectric projections; and recessed access gate lines individually extending transversally across the active area regions and extending between the ends of immediately end-to-end adjacent active area regions within the dielectric trench isolation material.
地址 Boise ID US
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