发明名称 LOW SURFACE ENERGY PHOTORESIST COMPOSITION AND PROCESS
摘要 A fluorpolymer-photoresist composition containing fluorinated polymer for containment of liquid inks in the printing of electronic devices. Methods of applying and treating the fluorpolymer-photoresist composition containing fluorinated polymer to provide low surface energy before and after processing and development of the photoresist.
申请公布号 WO2016085902(A1) 申请公布日期 2016.06.02
申请号 WO2015US62267 申请日期 2015.11.24
申请人 E. I. DU PONT DE NEMOURS AND COMPANY 发明人 SKULASON, HJALTI
分类号 G03F7/004;G03F7/16 主分类号 G03F7/004
代理机构 代理人
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