发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a cured film particularly excellent in heat resistance and flatness and excellent in adhesion to a base substrate such as glass and transparency, and to provide a composition excellent in coatability giving the cured film.SOLUTION: The photosensitive composition contains a polyester amide acid, a compound having a polymerizable double bond, a photopolymerization initiator, an epoxy compound, and an epoxy curing agent. The polyester amide acid is obtained by reacting a tetracarboxylic acid dianhydride, a diamine, and a polyhydric hydroxy compound as essential raw material components.SELECTED DRAWING: None
申请公布号 JP2016103010(A) 申请公布日期 2016.06.02
申请号 JP20150219583 申请日期 2015.11.09
申请人 JNC CORP 发明人 KONDO MANABU;KOBARI YUKI
分类号 G03F7/037;C08G59/02;C08G73/10;G02B5/20;G03F7/027;G03F7/031;G03F7/032;G06F3/041;H01L27/14 主分类号 G03F7/037
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