Lithographic Apparatus and Device Manufacturing Method

摘要

A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.

主权项

1. A lithographic apparatus comprising:
a support configured to support a patterning device, the patterning device configured to impart a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a positioning device for in use positioning the substrate table relative to the projection system, the positioning device comprising:
a first positioning member mounted to the substrate table; anda second positioning member co-operating with the first positioning member to position the substrate table, the second positioning member being mounted to a support structure; and a position measurement system configured to measure a position of a bottom surface of the substrate table in a direction of an optical axis.