| 发明名称 |
PELLICLE AND EXPOSURE MASK INCLUDING THE SAME |
| 摘要 |
A pellicle includes a pellicle frame, a pellicle membrane, and an attaching element, a first surface of the attaching element having exposed pores. |
| 申请公布号 |
US2016154299(A1) |
申请公布日期 |
2016.06.02 |
| 申请号 |
US201514849235 |
申请日期 |
2015.09.09 |
| 申请人 |
CHOI Jae-hyuck;KIM Jin-su;KIM Kyoung-mi;KIM Byung-gook |
发明人 |
CHOI Jae-hyuck;KIM Jin-su;KIM Kyoung-mi;KIM Byung-gook |
| 分类号 |
G03F1/64 |
主分类号 |
G03F1/64 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A pellicle, comprising:
a pellicle frame, a pellicle membrane, and an attaching element, a first surface of the attaching element having exposed pores. |
| 地址 |
Seoul KR |
