| 发明名称 |
PHOTOCURABLE COMPOSITION |
| 摘要 |
A rapid-curing photocurable composition exerting excellent adhesion performance even with a low cumulative light quantity and being curable in a short time, thus ensuring excellent workability, is provided. A photocurable composition is made to includes: (A) a crosslinkable silicon group-containing organic polymer; (B) a photobase generator; and (C1) a silicon compound having an Si—F bond and/or (C2) one or more fluorine-based compounds selected from the group consisting of boron trifluoride, a boron trifluoride complex, a fluorinating agent, and an alkali metal salt of a polyfluoro compound. The (B) photobase generator is preferably a photolatent tertiary amine. |
| 申请公布号 |
US2016152783(A1) |
申请公布日期 |
2016.06.02 |
| 申请号 |
US201414905580 |
申请日期 |
2014.07.11 |
| 申请人 |
CEMEDINE CO., LTD. |
发明人 |
YAMAGA Hiroshi;OKAMURA Naomi;WATANABE Yutaka;ASAI Ryosuke;KOUNO Shouma;SAITO Atsushi |
| 分类号 |
C08J3/28;C08L33/14;C09D133/14;C09J133/14;C09D171/02;C08L71/02;C09J171/02 |
主分类号 |
C08J3/28 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photocurable composition comprising:
(A) a crosslinkable silicon group-containing organic polymer; (B) a photobase generator; and (C1) a silicon compound having an Si—F bond and/or (C2) one or more fluorine-based compounds selected from the group consisting of boron trifluoride, a boron trifluoride complex, a fluorinating agent, and an alkali metal salt of a polyfluoro compound. |
| 地址 |
Shinagawa-ku,Tokyo JP |
