发明名称 METHOD FOR THE PREPARATION OF TRICHLOROMETHYL-GROUP-SUBSTITUTED BENZENE
摘要 The present application relates to a method for photochlorination, and specifically to photochlorination by a photochemical reaction of an aromatic compound with gaseous chlorine so as to prepare a trichloromethyl-substituted benzene, and to a method using bis-(trichloromethyl)-benzene as the trichloromethyl-substituted benzene to prepare by further reaction bis-(chloroformyl)-benzene. Through the control of temperature, illuminance and consumption of gaseous chlorine, the method of this application can greatly improve the purity of trichloromethyl-substituted benzene and further prepare polymer-grade bis-(chloroformyl)-benzene with low cost. The present application also relates to a method for purifying trichloromethyl-substituted benzene, and specifically to a method for purifying trichloromethyl-substituted benzene via molecular distillation. The present application further relates to a photochlorination reactor for use in photochlorination reactions (such as those of the present application).
申请公布号 US2016152533(A1) 申请公布日期 2016.06.02
申请号 US201414905775 申请日期 2014.09.12
申请人 SHANGHAI FANGLUN NEW MATERIAL TECHNOLOGY CO., LTD. 发明人 WANG Nongyue;QU Xiongwei;LI Guohua;ZHAO Quanzhong;SHAO Jianming;WEN Guoqiang
分类号 C07C17/08 主分类号 C07C17/08
代理机构 代理人
主权项
地址 Shanghai CN