| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a production method capable of obtaining a resin for a resist composition at a high yield. <P>SOLUTION: The present invention discloses the method of producing the resin for the resist composition, capable of polymerizing a monomer in a mixed solvent mixed with a solvent (1) and a solvent (2), wherein the solvent (1) has a solubility parameter within a range of 11.4-13.0 [cal/mol]<SP POS="POST">1/2</SP>, and a solvent (2) is tetrahydrofuran. The monomer is preferably polymerized by an action of a polymerization initiator, in the production method, and the monomer is preferably polymerized by dropping a mixture liquid containing the monomer, the polymerization initiator and the solvent (2), into the solvent (1). <P>COPYRIGHT: (C)2013,JPO&INPIT |
