| 摘要 |
PROBLEM TO BE SOLVED: To provide a high-quality Cu-Ga alloy sputtering target containing sodium (Na) that may add Na to a sputter film.SOLUTION: A Cu-Ga alloy sputter target is produced as follows: a sodium compound mixed alloy powder is prepared by mixing a Cu-Ga alloy powder and a sodium compound; a sodium-containing material coated alloy powder in which the Cu-Ga alloy powder is surrounded by a sodium-containing material is prepared by heating a mixed powder of the Cu-Ga alloy powder and a powder of a sodium-containing organic material; and then the sodium compound mixed alloy powder and the sodium-containing material coated alloy powder are mixed and sintered by a hot-press. |
