发明名称 Method for manufacturing a piezoelectric element
摘要 A piezoelectric element includes a support body having a displacing part capable of undergoing displacement, a lower electrode layer having a lower main electrode body and a lower electrode wire part with the lower main electrode body being formed on the support body and provided within the displacing part in a plan view and the lower electrode wire part being connected to the lower main electrode body and provided across an interior and an exterior of the displacing part, a first piezoelectric layer provided on the lower main electrode body, an upper electrode layer provided across the interior and exterior of the displacing part with at least a part of the upper electrode layer being layered on the first piezoelectric layer and insulated from the lower electrode layer, and a second piezoelectric layer provided on the support body to cover at least a part of the lower electrode wire part.
申请公布号 US9356227(B2) 申请公布日期 2016.05.31
申请号 US201314072913 申请日期 2013.11.06
申请人 Seiko Epson Corporation 发明人 Matsuda Hiroshi
分类号 H04R17/00;H01L41/27;B06B1/06;H01L41/08;H01L41/09;H01L41/047 主分类号 H04R17/00
代理机构 Global IP Counselors, LLP 代理人 Global IP Counselors, LLP
主权项 1. A method for manufacturing a piezoelectric element comprising: patterning a lower electrode layer on a support body with the support body having a displacing part that is capable of undergoing displacement in a thickness direction, and the lower electrode layer having a lower main electrode body and a lower electrode wire part, the lower main electrode body being provided in a region inside an outer peripheral edge of the displacing part in a plan view when the support body is viewed in the thickness direction of the displacing part, and the lower electrode wire part being connected to the lower main electrode body and provided across a region outside and the region inside the outer peripheral edge of the displacing part; layering on the lower electrode layer a piezoelectric layer including a first piezoelectric layer and a second piezoelectric layer; performing an etching treatment outside a region in which the first piezoelectric layer is to be formed and a region in which the second piezoelectric layer is to be formed, and forming the first piezoelectric layer and the second piezoelectric layer so that the first piezoelectric layer is provided on the lower main electrode body in the region inside the outer peripheral edge of the displacing part in the plan view, and the second piezoelectric layer is provided on the support body so as to cover at least a part of the lower electrode wire part, the first piezoelectric layer being formed at a first position that does not overlap with the outer peripheral edge of the displacing part in the plan view; layering an upper electrode precursor layer; and performing etching and patterning of the upper electrode precursor layer so that an upper electrode layer is provided across the region outside and the region inside the outer peripheral edge of the displacing part in the plan view, at least a part of the upper electrode layer being layered on the first piezoelectric layer and insulated from the lower electrode layer.
地址 Tokyo JP