发明名称 |
Light-emitting device and method for manufacturing the same |
摘要 |
A method for manufacturing a light-emitting device comprising the steps of: providing a substrate; forming a semiconductor epitaxial stack on the substrate; and forming multiple isolation trenches in the semiconductor epitaxial stack by using a laser beam irradiating the semiconductor epitaxial stack to define multiple light-emitting diode units wherein partial of the substrate is exposed by the isolation trenches. |
申请公布号 |
US9356189(B2) |
申请公布日期 |
2016.05.31 |
申请号 |
US201414223495 |
申请日期 |
2014.03.24 |
申请人 |
EPISTAR CORPORATION |
发明人 |
Wu Jar-Yu;Kun Yu-Ming;Tseng Chun-Lung |
分类号 |
H01L21/00;H01L33/00;H01L27/15;H01L33/38 |
主分类号 |
H01L21/00 |
代理机构 |
Muncy, Geissler, Olds & Lowe, P.C. |
代理人 |
Muncy, Geissler, Olds & Lowe, P.C. |
主权项 |
1. A method for manufacturing a light-emitting device, comprising the steps of:
providing a substrate; forming a semiconductor epitaxial stack on the substrate, comprising:
forming a first conductive-type semiconductor layer on the substrate;forming an active layer on the first conductive-type semiconductor layer; andforming a second conductive-type semiconductor layer on the active layer; forming multiple mesas in the semiconductor epitaxial stack and exposing part of the first conductive-type semiconductor layer; and forming multiple isolation trenches in the semiconductor epitaxial stack by using a laser beam irradiating the semiconductor epitaxial stack to define multiple light-emitting diode units, wherein part of the substrate is exposed by the isolation trenches, and wherein a sidewall of the isolation trenches is roughened and/or the slope of the sidewall of the isolation trenches is larger than the slope of a sidewall of the mesas. |
地址 |
Hsinchu TW |