| 摘要 |
The purpose of the present invention is to prevent a substrate from being stained by inhibiting processing liquid supplied to the substrate from being attached to the substrate after drying the processing liquid. The substrate processing system for processing a substrate according to the present invention comprises: a maintenance plate installed to be able to rotate about a vertical axis; a substrate maintaining member installed on the maintenance plate and maintaining the substrate; a rotation driving part for rotating the substrate, which is maintained on the substrate maintaining member, in a predetermined direction; and a processing fluid supply part for supplying processing liquid to the substrate maintained on the substrate maintaining member. The substrate maintaining member has: a first side surface part formed at a position facing the substrate; and a second side surface part and a third side surface part adjacent to the first side surface part. The first side surface part has a grabbing part for grabbing the end surface of the substrate, the second side surface part forms a cutting edge part between the first side surface part and the second side surface part, and a liquid flow guiding part is prepared to guide the processing liquid supplied to the substrate below the substrate. |
