发明名称 Method for increasing adhesion of copper to polymeric surfaces
摘要 Techniques disclosed herein a method and system for conditioning a polymeric layer on a substrate to enable adhesion of a metal layer to the polymeric layer. Techniques may include conditioning the polymeric layer with nitrogen-containing plasma to generate a nitride layer on the surface of the polymeric layer. In another embodiment, the conditioning may include depositing a CuN layer using a lower power copper sputtering process in a nitrogen rich environment. Following the condition process, a higher power copper deposition or sputtering process may be used to deposit copper onto the polymeric layer with good adhesion properties.
申请公布号 US9355864(B2) 申请公布日期 2016.05.31
申请号 US201414308420 申请日期 2014.06.18
申请人 TEL NEXX, INC.;TEL EPION INC. 发明人 Seryogin Georgiy;Tetreault Thomas G.;Golovato Stephen N.;Chandrasekaran Ramya
分类号 H01L21/44;H01L21/3205;H01L23/532;H01L21/285;H01L23/552 主分类号 H01L21/44
代理机构 Rothwell, Figg, Ernst & Manbeck, P.C. 代理人 Rothwell, Figg, Ernst & Manbeck, P.C.
主权项 1. A method for adhering copper to a polymeric material, comprising: exposing a substrate to a nitrogen-containing environment to increase adhesion of first and second copper-containing layers to the substrate, the substrate comprising a tray of semiconductor devices that are at least partially covered with polymeric material; depositing, at a first power level, the first copper-containing layer onto the polymeric material surface present on the substrate; and depositing, at a second power level, the second copper-containing layer onto the first copper-containing layer, wherein the second power level is greater than the first power level.
地址 Billerica MA US