发明名称 Microphone unit having a plurality of diaphragms and a signal processing unit
摘要 A microphone unit includes a microphone substrate. A plurality of diaphragm units are disposed on the microphone substrate. Each of the diaphragm units includes a diaphragm. A plurality of partition walls are disposed on the microphone substrate. Each of the partition walls surrounds the diaphragm so as to define a first area. A signal processor is disposed at a second area outside the first area and is configured to process signals output from the diaphragm units.
申请公布号 US9357313(B2) 申请公布日期 2016.05.31
申请号 US200912424226 申请日期 2009.04.15
申请人 Funai Electric Co., Ltd. 发明人 Tanaka Fuminori;Horibe Ryusuke;Inoda Takeshi;Takano Rikuo;Sugiyama Kiyoshi;Fukuoka Toshimi;Ono Masatoshi
分类号 H04R11/04;H04R19/04 主分类号 H04R11/04
代理机构 Osha Liang LLP 代理人 Osha Liang LLP
主权项 1. A microphone unit comprising: a microphone substrate; a plurality of diaphragm units disposed on the microphone substrate, each of the diaphragm units including a diaphragm; a plurality of partition walls disposed on the microphone substrate, each of the partition walls surrounding the diaphragm so as to define a first area; a first volume of space surrounded by a first partition wall of the plurality of partition walls and the microphone substrate; a second volume of space surrounded by a second partition wall of the plurality of partition walls and the microphone substrate; a signal processor disposed at a second area outside the first area and configured to process signals output from the diaphragm units; a first electrode terminal provided on the microphone substrate in the first area; a second electrode terminal provided on the microphone substrate in the second area; and a third electrode terminal provided on the microphone substrate in a third area, wherein a height of the partition walls from the microphone substrate is higher than a height of the diaphragm units from the microphone substrate, wherein each of the diaphragm units includes a holding part that holds the diaphragm and is disposed in direct contact with the microphone substrate, wherein each of the partition walls surrounds the holding part, wherein the first volume of space and the second volume of space are equal, wherein an electrode terminal of a first one of the diaphragm units and the first electrode terminal are electrically connected together in the first area, wherein an electrode terminal of the signal processor and the second electrode terminal are electrically connected together in the second area, wherein the first electrode terminal and the second electrode terminal are electrically connected together by a first wiring embedded in the microphone substrate, wherein an electrode terminal of a second one of the diaphragm units and the third electrode terminal are electrically connected together in the third area, wherein the third electrode terminal and the second electrode terminal are electrically connected to ether b a second wiring embedded in the microphone substrate, and wherein the first wiring and the second wiring are equal in length.
地址 Osaka JP