发明名称 System and method for defect detection and photoluminescence measurement of a sample
摘要 Defect detection and photoluminescence measurement of a sample directing a beam of oblique-illumination wavelength light onto a portion of the sample, directing a beam of normal-illumination wavelength light for causing one or more photoluminescing defects of the sample to emit photoluminescent light onto a portion of the sample, collecting defect scattered radiation or photoluminescence radiation from the sample, separating the radiation from the sample into a first portion of radiation in the visible spectrum, a second portion of radiation including the normal-illumination wavelength light, and at least a third portion of radiation including the oblique-illumination wavelength light, measuring one or more characteristics of the first portion, the second portion or the third portion of radiation; detecting one or more photoluminescence defects or one or more scattering defects based on the measured one or more characteristics of the first portion, the second portion or the third portion of radiation.
申请公布号 US9354177(B2) 申请公布日期 2016.05.31
申请号 US201414212496 申请日期 2014.03.14
申请人 KLA-Tencor Corporation 发明人 Sappey Romain
分类号 G01N21/64;G01N21/88 主分类号 G01N21/64
代理机构 Suiter Swantz pc llo 代理人 Suiter Swantz pc llo
主权项 1. A system for defect detection and photoluminescence measurement of a sample comprising: an oblique-incidence radiation source configured to direct a beam of light of an oblique-illumination wavelength onto a portion of the sample along a direction oblique to the surface of the sample; a normal-incidence radiation source configured to direct a beam of light of a normal-illumination wavelength different from the oblique-illumination wavelength onto a portion of the sample along a direction substantially normal to the surface of the sample, wherein the beam of light of the normal-illumination wavelength is suitable for causing one or more photoluminescing defects of the sample to emit photoluminescent light; a sample stage assembly configured to secure the sample and selectively actuate the sample in order to perform a scanning process with at least the oblique-incidence radiation source and the normal-incidence radiation source; a set of collection optics configured to collect radiation from the sample, the radiation from the sample including at least one of radiation elastically scattered by one or more defects of the sample or photoluminescence radiation emitted by the one or more photoluminescing defects of the sample; a filter sub-system configured to receive at least a portion of the radiation collected by the set of collection optics, wherein the filter sub-system is configured to separate the radiation from the sample into a first portion of radiation including one or more wavelengths in the visible or near-infrared spectrum associated with the light emitted by the one or more photoluminescing defects of the sample, a second portion of radiation including the normal-illumination wavelength, and at least a third portion of radiation including the oblique-illumination wavelength; a detection sub-system including a first sensor for measuring one or more characteristics of the first portion of radiation transmitted by the filter sub-system, a second sensor for measuring one or more characteristics of the second portion of radiation transmitted by the filter sub-system and at least a third sensor for measuring one or more characteristics of the third portion of radiation transmitted by the filter sub-system; and a controller communicatively coupled to the first sensor, the second sensor and the third sensor, the controller configured to: detect one or more scattering defects based on at least one of the one or more characteristics measured by the one or more characteristics measured by the second sensor and the third sensor; anddetect one or more photoluminescence defects based on at least one of the one or more characteristics measured by the first sensor, the one or more characteristics measured by the second sensor and the one or more characteristics measured by the third sensor.
地址 Milpitas CA US