发明名称 |
ITO METAL LAMINATE HAVING EXCELLENT ADHESION AND ETCHING PERFORMANCE AND METHOD FOR FORMING ELECTRODE |
摘要 |
Disclosed are an ITO metal laminate having excellent adhesion and etching properties, and a method for forming an electrode. According to an aspect of the present invention, the ITO metal laminate comprises: a base substrate; an ITO layer formed on at least one side of the base substrate; a tie coat layer formed on top of the ITO layer and comprising a nickel-molybdenum-iron (Ni-Mo-Fe) alloy; and a conductive layer formed on top of the tie coat layer. |
申请公布号 |
KR20160060927(A) |
申请公布日期 |
2016.05.31 |
申请号 |
KR20140163130 |
申请日期 |
2014.11.21 |
申请人 |
LS MTRON LTD. |
发明人 |
BANG, SUNG HWAN;KIM, KYUNG KAK;JUNG, HO YOUNG;SHIN, CHUNG HWAN |
分类号 |
B32B9/00;B32B15/04;C23C14/34;C23C28/00;G02F1/1343 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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