发明名称 ITO METAL LAMINATE HAVING EXCELLENT ADHESION AND ETCHING PERFORMANCE AND METHOD FOR FORMING ELECTRODE
摘要 Disclosed are an ITO metal laminate having excellent adhesion and etching properties, and a method for forming an electrode. According to an aspect of the present invention, the ITO metal laminate comprises: a base substrate; an ITO layer formed on at least one side of the base substrate; a tie coat layer formed on top of the ITO layer and comprising a nickel-molybdenum-iron (Ni-Mo-Fe) alloy; and a conductive layer formed on top of the tie coat layer.
申请公布号 KR20160060927(A) 申请公布日期 2016.05.31
申请号 KR20140163130 申请日期 2014.11.21
申请人 LS MTRON LTD. 发明人 BANG, SUNG HWAN;KIM, KYUNG KAK;JUNG, HO YOUNG;SHIN, CHUNG HWAN
分类号 B32B9/00;B32B15/04;C23C14/34;C23C28/00;G02F1/1343 主分类号 B32B9/00
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