SUBSTRATE TREATING APPARATUS HAVING VORTEX PREVENTION CHAMBER AND THE METHOD THEREOF

摘要

The present invention relates to a substrate processing apparatus which can prevent a vortex of process gas from being generated inside a chamber main body to inject or eject a substrate through an upper part of the chamber main body by ascending and descending a cover for covering the upper part of the chamber main body. To this end, the substrate processing apparatus of the present invention comprises: a chamber main body (100) having a susceptor (400) mounting a substrate inside the susceptor, of which an upper part is opened; a cover (200) for opening and closing the opened upper part of the chamber main body (100); and a cover opening and closing drive unit (300) providing driving force to move the cover (200) in a vertical direction to open and close the upper part of the chamber main body (100).