PATTERN FORMATION METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION USED THEREFOR, ELECTRONIC DEVICE USING THEM, AND METHOD FOR PRODUCING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a pattern formation method which can form patterns with shapes having excellent exposure latitude, development properties and pattern profiles.SOLUTION: The pattern formation method comprises: (a) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, which contains a compound represented by the general formula (A-1) and a resin with a repeating unit represented by the general formula (nI) whose polarity increases by an action of an acid so as to reduce solubility in a developer containing an organic solvent; (b) irradiating the film with an actinic ray or radiation; and (c) developing the film irradiated with the actinic ray or radiation using the developer containing the organic solvent.SELECTED DRAWING: None