PRODUCTION METHOD OF SEMICONDUCTOR DEVICE, SUBSTRATE TREATMENT APPARATUS AND PROGRAM

摘要

PROBLEM TO BE SOLVED: To adjust a work function, and to form a conductive thin film having a low work function value.SOLUTION: A program method of a semiconductor device has steps for: storing a substrate into a treatment chamber; supplying onto the substrate in time sharing in a prescribed number of times, halogen-based raw material gas containing a first element, first reaction gas containing a second element, and second reaction gas containing a third element which is a homologous element of the second element, to thereby form a film containing the first element, the second element and the third element on the substrate; and carrying out the substrate from the treatment chamber.SELECTED DRAWING: Figure 5