发明名称 |
PHOTOSENSITIVE ELEMENT, METHOD FOR MANUFACTURING SUBSTRATE WITH RESIST PATTERN, METHOD FOR MANUFACTURING PRINTED WIRING BOARD, AND METHOD FOR MANUFACTURING TOUCH PANEL |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive element excellent in transfer property and degassing property of a photosensitive resin composition layer.SOLUTION: The photosensitive element of the present invention includes a support body and a photosensitive resin composition layer formed on the support body. The photosensitive resin composition layer comprises components of: (A) a polymer component comprising a polymer (A1) having a structural unit (a1) including a group in which an acid group is protected by an acid decomposable group; (B) a photoacid generator; and (C) at least one compound represented by general formula (1a) or (1b) below. In the formulae, Rrepresents an alkyl group having 1 to 20 carbon atoms, or the like; and Rrepresents an alkylene group having 1 to 20 carbon atoms.SELECTED DRAWING: None |
申请公布号 |
JP2016099374(A) |
申请公布日期 |
2016.05.30 |
申请号 |
JP20140233634 |
申请日期 |
2014.11.18 |
申请人 |
HITACHI CHEMICAL CO LTD |
发明人 |
TAMADA HARUHISA;HIRAO KOHEI |
分类号 |
G03F7/004;G03F7/039;G06F3/041;H05K3/06;H05K3/18 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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