LOW CONTACT IMPRINT LITHOGRAPHY TEMPLATE CHUCK SYSTEM FOR IMPROVED OVERLAY CORRECTION
摘要
Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.
申请公布号
SG11201603475R(A)
申请公布日期
2016.05.30
申请号
SG11201603475R
申请日期
2014.11.07
申请人
CANON NANOTECHNOLOGIES, INC.;TOSHIBA CORPORATION
发明人
MEISSL, MARIO JOHANNES;CHERALA, ANSHUMAN;CHOI, BYUNG-JIN;BAMESBERGER, SETH J.