SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE THIN FILM, AND CONDUCTIVE FILM

摘要

PROBLEM TO BE SOLVED: To provide a transparent conductive oxide thin film having higher light transmittance and conductivity.SOLUTION: A sputtering target contains 60-87 mol% ZnO and 10-25 mol% GaO, and further contains at least one oxide selected from TiOand SnO. The sum total of the contents of TiOand SnOis 1-15 mol%. The sputtering target has a structure where particles containing GaOas a main component and particles containing at least one oxide selected from TiOand SnOas a main component are dispersed in a matrix containing ZnO as a main component. The particles containing GaOas a main component and the particles containing at least one oxide selected from TiOand SnOas a main component have an average particle diameter of 1.5-10 μm.SELECTED DRAWING: Figure 1