substrate processing apparatus

摘要

The present invention provides a substrate processing apparatus. The substrate processing apparatus of the present invention comprises: a process chamber having a lower chamber of which an upper part is opened, and an upper chamber for closing the opened upper part of the lower chamber; a support member installed inside the lower chamber, and having a plurality of substrates laid on the same plane; and a reactive member installed on the bottom of the upper chamber to face the support member, and having a plurality of reactive cells arranged on a concentric circle around the upper chamber. Any one of the reactive cells is a high velocity vortex reactive cell having a gas passage connected to an edge from the center of the upper chamber to cross the center of the bottom, thereby securing a high quality thin film by inducing a high speed vortex flow of gas.