发明名称 DIRECT LIQUID DEPOSITION
摘要 Liquid precursor material of a coating substance and a solvent is provided in a reservoir (STEP1, STEP1′). In one variant the liquid precursor material is distilled (STEP2), the resultant liquid coating substance is vaporized (STEP3) and ejected through a vapor distribution nozzle arrangement (7) into a vacuum recipient (3) and onto substrate 5 to be coated. Alternatively, the liquid precursor material is directly vaporized (STEP3′). From the two-component vapor coating substance vapor is applied to substrate 5′ to be coated. In this variant separation of solvent vapor and coating substance vapor is performed especially downstream vaporizing (STEP2′).
申请公布号 SG10201603129P(A) 申请公布日期 2016.05.30
申请号 SG10201603129P 申请日期 2012.10.19
申请人 OERLIKON ADVANCED TECHNOLOGIES AG 发明人 VOSER, STEPHAN;RAVELLI, FABIO ANTONIO;GAECHTER, BRUNO
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