- - METHOD OF RESOLVING COLOR CONFLICTS FOR CELL-BASED DESIGNS WITH MULTI-PATTERN LITHOGRAPHY

摘要

The present invention relates to a method for resolving color conflicts for cell-based designs using a multi-pattern lithography, which comprises the following steps: receiving data files including disposition data for a plurality of circuit cells; determining whether the incompatible circuit cell is re-colored; and directing whether the incompatible circuit cell is re-colored at least partially, based on at least one form present on a color swap layer having the data file. The circuit cells include respective layout portions which are correlated with a plurality of lithography colors. The form of the color swap layer allows a mask producing device to recolor the portion of the incompatible circuit cells directed by the form of the color swap layer.