发明名称 |
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device which inhibits thermal destruction occurring at a connection part of an active region and a termination region at the time of turn-off of the semiconductor device.SOLUTION: A semiconductor device using a silicon carbide substrate 30 comprises: an active region 15 which is a part of a silicon carbide substrate 30 and includes pn junction formed in the silicon carbide substrate 30 and a current flows when a voltage is applied to the semiconductor device; and a termination region 16 which is a part of the silicon carbide substrate 30 and formed along a circumference of the active region 15, in which a minority carrier life time in the active region 15 is longer than a minority carrier life time in the termination region 16.SELECTED DRAWING: Figure 2 |
申请公布号 |
JP2016100455(A) |
申请公布日期 |
2016.05.30 |
申请号 |
JP20140236248 |
申请日期 |
2014.11.21 |
申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
TAGUCHI KENSUKE;EBIHARA KOHEI |
分类号 |
H01L21/336;H01L29/06;H01L29/12;H01L29/739;H01L29/78;H01L29/861;H01L29/868 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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