发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which inhibits thermal destruction occurring at a connection part of an active region and a termination region at the time of turn-off of the semiconductor device.SOLUTION: A semiconductor device using a silicon carbide substrate 30 comprises: an active region 15 which is a part of a silicon carbide substrate 30 and includes pn junction formed in the silicon carbide substrate 30 and a current flows when a voltage is applied to the semiconductor device; and a termination region 16 which is a part of the silicon carbide substrate 30 and formed along a circumference of the active region 15, in which a minority carrier life time in the active region 15 is longer than a minority carrier life time in the termination region 16.SELECTED DRAWING: Figure 2
申请公布号 JP2016100455(A) 申请公布日期 2016.05.30
申请号 JP20140236248 申请日期 2014.11.21
申请人 MITSUBISHI ELECTRIC CORP 发明人 TAGUCHI KENSUKE;EBIHARA KOHEI
分类号 H01L21/336;H01L29/06;H01L29/12;H01L29/739;H01L29/78;H01L29/861;H01L29/868 主分类号 H01L21/336
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