发明名称 |
THIN FILM TRANSISTOR AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a thin film transistor and a manufacturing method of the same, which can achieve downsizing even though using an oxide semiconductor layer.SOLUTION: A thin film transistor comprises: an oxide semiconductor layer 12 including a channel region 12c, and a source region 12s and a drain region 12d which are located to sandwich the channel region 12c; a gate electrode 13 arranged at a distance from and opposite to the channel region 12c of the oxide semiconductor layer 12; a source electrode 14 electrically connected to the source region 12s of the oxide semiconductor layer 12; a drain electrode 15 electrically connected to the drain region 12d of the oxide semiconductor layer 12; an undercoat layer 17 arranged adjacent to the source region 12s and the drain region 12d of the oxide semiconductor layer 12; and a hydrogen block layer 27 which has a hydrogen concentration lower than that of the undercoat layer 17 and separates the undercoat layer 17 and the channel region 12c of the oxide semiconductor layer 12.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016100521(A) |
申请公布日期 |
2016.05.30 |
申请号 |
JP20140237936 |
申请日期 |
2014.11.25 |
申请人 |
JAPAN DISPLAY INC |
发明人 |
WATAKABE SO;ISHIDA ARICHIKA;OKADA TAKASHI;FUCHI MASAYOSHI;HANADA AKIHIRO |
分类号 |
H01L21/336;G02F1/1368;H01L21/318;H01L29/786 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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