COMPOUND, RESIN, RESIST COMPOSITION, AND PRODUCTION METHOD OF RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern can be produced with a good collapse margin.SOLUTION: There are provided a resin which comprises a structural unit derived from a compound represented by a formula (I), and a resist composition which comprises the above resin. The resist composition preferably contains an acid generator, and more preferably contains a salt having a lower acidity than an acid generated from the acid generator. In the formula (I), Rand Reach independently represent a group having a lactone ring.SELECTED DRAWING: None