发明名称 |
FLOWABLE FILM CURING PENETRATION DEPTH IMPROVEMENT AND STRESS TUNING |
摘要 |
PROBLEM TO BE SOLVED: To improve control of a UV cure process of a flowable dielectric film.SOLUTION: A method comprises: forming a flowable dielectric layer on a substrate, the substrate being positioned in a processing region of a process chamber 402; delivering an oxygen-containing gas to the substrate and the processing region, the flowable dielectric layer being immersed in the oxygen-containing gas for a period of time creating a soaked dielectric layer 404; purging the oxygen-containing gas from the processing region after the immersion 406; and exposing the soaked dielectric layer to UV radiation to thereby at least partially cure the soaked dielectric layer 408.SELECTED DRAWING: Figure 4 |
申请公布号 |
JP2016096331(A) |
申请公布日期 |
2016.05.26 |
申请号 |
JP20150206868 |
申请日期 |
2015.10.21 |
申请人 |
APPLIED MATERIALS INC |
发明人 |
LIANG JINGMEI;LEE JUNG CHAN;SUN YONG |
分类号 |
H01L21/318;C23C16/34;C23C16/56 |
主分类号 |
H01L21/318 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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